admeta advanced
metallization
conference

ADMETA History

Timeline of ADMETA / AMC History

Year Event
Spring 1984 The first VLSI Multilevel Interconnection Conference (VMIC) was organized by the IEEE, reflecting growing interest in multilayer LSI interconnect technology.
Fall 1984 Dr. Robert S. Blewer of Sandia National Laboratories established the first Tungsten Workshop in Albuquerque, New Mexico, USA.
1985 The 2nd Tungsten Workshop was held in Albuquerque.
Spring 1986 Proceedings of the 1st and 2nd Workshops were jointly published by MRS as the “Red Book.” Annual publication continued thereafter.
March 1988 The symposium “CVD Technology for VLSI” was organized by the ECS Japan Chapter.
1988 At the 5th Tungsten Workshop in Albuquerque, Japanese organizers were formally requested to prepare a workshop in Japan.
September 20–21, 1989 The US Tungsten Workshop was held in San Mateo, California.
October 19–20, 1989 The first Japanese Tungsten Workshop was held at the Centennial Hall of Tokyo Institute of Technology.
1991 The conference name was changed to Advanced Metallization for ULSI Applications. The second Japanese conference was held.
1993 The third Japanese conference was held at the Sanjo Conference Hall, University of Tokyo.
1995 The fourth Japanese conference was held. ADMETA thereafter became an annual conference.
1996 Due to a shortened preparation period, the conference focused mainly on invited talks and tutorials.
Around 1996 One-day tutorial programs for engineers from equipment and related industries were introduced in earnest.
1997 The conference adopted a standard format including contributed papers and became firmly established as an annual event.
Around 1997 The name “ADMETA” became widely established on the Japanese side.
1998 The conference name was standardized as Advanced Metallization Conference (AMC), forming the basis of the current naming system.
2000 The conference was officially approved by the Silicon Technology Subcommittee of the Japan Society of Applied Physics.
2003 The ADMETA Award for best papers was established.
2004 The Technical Achievement Award was introduced.
2000s onward The chairmanship began alternating between academia and industry, symbolizing industry–academia collaboration.
2010s Conference topics expanded significantly to include Cu/Low-k interconnects, CMP, reliability science, MEMS/RF integration, packaging, and advanced process technologies.
2020–2021 The conference adapted to online formats during the COVID-19 period.
From 2022 The on-site and online hybrid conference format, including tutorials and technical sessions, was introduced.