advanced
metallization
conference

Demonstration of Anisotropic Resistivity in CoSn Kagome Metal Thin Films

Dr. Tomoya NAKATANI

( National Institute of Materials Science)

Topographically Selective Atomic Layer Deposition of HfO2 Thin Films in High Aspect Ratio Structures by Vapor-Dosed Surface Protector

Ms. Jiwoo OH

( Hanyang University)

Study on the Removal Method of nanoparticles using Cleaning-Assisted resin Particles

Prof. Keisuke SUZUKI

( Kyushu Institute of Technology)

Enhancement of CMP Removal Rate of SiC by Ion Implantation

Dr. Yuya UCHIDA

(Nissin Ion Equipment Co.)