ADMETAPlus 2012: 22nd Asian Committee Members
*** Executive Committee Members ***
H. KAWASAKI, Mitsubishi Heavy Industries
(Chairperson)
J. KOIKE, Tohoku University
(Vice Chairperson)
E. KONDO, Yamanashi University
(Program)
F. ITO, Renesas Electronics
(Vice Program)
K. MAEKAWA, Renesas Electronics
(Tutorial)
K. MATSUSHITA, ASM Japan
(General Arrangements)
H. MACHIDA, Gas-Phase Growth (Financial)
A. TSUKUNE, Taiyo Nippon
Sanso (Publicity)
*** Committee Members***
J. AMANOKURA, Hitachi Chemical
D. L. DIEHL, Applied Materials
Japan
S. FUKUYAMA, Fujitsu Semiconductor
N. HATA, AIST
Y. HIGUCHI, ULVAC
S. HIZUME, Lam Research
J. INOUE, The University
of Tokyo
N. MAKINO, JX Nippon Mining
& Metals
N. MATSUKI, Canon ANELVA
T. NAKATA, Ebara
O. NAKATSUKA, Nagoya University
T. NEMOTO, Tokyo ElectronTechnology Development
Institute
K. OKUTANI, CASMAT
T. SAITO, Osaka Prefecture
University
M. SEKIGUCHI, JSR
H. SHIBATA, Toshiba
T. SHIMAZU, Mitsubishi
Heavy Industries
N. SHIMIZU, Philtech
N. SHIMOYAMA, NTT
M. SUGIYAMA, The University
of Tokyo
M. TADA, LEAP
S. TAKAHASHI, Sony
M. B. TAKEYAMA, Kitami
Institute of Technology
Y. TSUCHIYA, Renesas Electronics
Y. YAMADA, Hitachi High-Technologies
S. YOKOGAWA, Renesas Electronics
L. -J. CHEN, National Tsing
Hua University
G. -H. CHOI, Samsung Electronics
Y. -C. JOO, Seoul National
University
H. -J. KIM, Yonsei University
T. -K. Ku, ITRI
R. KUMMAR, A*STAR Institute
of Microelectronics
C. -C. LIU, UMC
T. NOGAMI, IBM
J. -G. PARK, Hanyang University
Y. -B. PARK, Andong National
University
W. -S. SHUE, TSMC
*** Advisory Members***
Y. HORIIKE, NIMS
H. KOMIYAMA, Mitsubishi
Research Institute
K. TSUBOUCHI, Tohoku University
M. MURAKAMI, Ritsumeikan
N. KOBAYASHI, ASM Japan
Y. YASUDA, Tohoku University
T. KIKKAWA, Hiroshima University
T. OHBA, The University
of Tokyo
S. ZAIMA, Nagoya University
T. OHTA, The University
of Tokyo
K. MASU, Tokyo Institute
of Technology
M. TSUJIMURA, Ebara
A. OHSAKI, Renesas Electronics
S. SHINGUBARA, Kansai University
T. YODA, Toshiba
Y. SHIMOGAKI, The University
of Tokyo
S. KONDO, Hitachi Chemical
K. UENO, Shibaura Institute
of Technology
|
|
