{"id":40,"date":"2023-02-02T16:51:22","date_gmt":"2023-02-02T07:51:22","guid":{"rendered":"https:\/\/www.admeta.org\/wp2023\/?post_type=cpt_admeta&#038;p=40"},"modified":"2023-02-02T16:51:22","modified_gmt":"2023-02-02T07:51:22","slug":"topics-2022-en","status":"publish","type":"cpt_admeta","link":"https:\/\/www.admeta.org\/2023\/en\/cpt_admeta\/topics-2022-en","title":{"rendered":"2022-4-en-Topics"},"content":{"rendered":"\r\n<h1 class=\"title\">Topics of Interest<\/h1>\r\n<div id=\"info\"> \r\n    <div class=\"border-double\">        \r\n        <p><b>[Topics of Interest]<\/b><br> \r\n        <b>Integration: <\/b>Interconnection Structure and Performance, <br> \r\n        &nbsp;&nbsp; Parasitic Capacitance, \r\n        Reliability Technology, Testing and Analysis<br> \r\n        <b>Reliability Science and Failure Analysis: <\/b>EM, SIV, TDDB, Defect Detection<br> \r\n        &nbsp;&nbsp;and Analysis, Failure Mechanism and Modeling<br> \r\n        <b>Metallization: <\/b>PVD, CVD, ALD, Plating, Barrier Metal, New Material, Alloy, \r\n        &nbsp;&nbsp;Supercritical Fluid, Reflow<br> \r\n        <b>Low-k Dielectric: <\/b>CVD, ALD, SOD, Film Properties, New Materials, <br> \r\n        &nbsp;&nbsp;Dielectric Structures (Air Gap), Metrology, etc.<br> \r\n        <b>CMP: <\/b>Planarization Technology, Slurry, Pad, Dress, End Point Detection, <br> \r\n        &nbsp;&nbsp;Cleaning, Anti-corrosive Technology, etc.<br> \r\n        <b>Contact: <\/b>Silicide, Interface, Solid Phase Reaction, Shallow Junction, Crystal \r\n        &nbsp;&nbsp;Properties, \r\n        Electron Properties, Carrier Transport, etc.<br> \r\n        <b>MEMS\/RF: <\/b> \r\n        Interconnection Structure and Materials, Packaging,<br>&nbsp;&nbsp; \r\n        Fabrication Process \r\n        Technology, Device Design, etc.<br> \r\n        <b>Emerging Technology: <\/b>Active Wiring, Power Electronics, Silicon Photonics, \r\n        &nbsp;&nbsp;Flexible Electronics, \r\n        Energy Harvesting, etc.<br> \r\n        <b>Backend Device Technology: <\/b>Tech. for Embedding Devices (MRAM,<br> &nbsp;&nbsp; \r\n        PCRAM, ReRAM, DRAM etc.), Materials and Processing of Magnetics,<br> \r\n        &nbsp;&nbsp; Phase-Change and Resistive-Change Devices, Electrode, Metallization, etc.<br> \r\n        <b>Nano Carbon: <\/b>Graphene, Carbon Nanotube, Deposition, Integration, <br> \r\n        &nbsp;&nbsp;Electrical Characteristics, Reliability, Evaluation, Analysis, etc.<br> \r\n        <b>3D and Packaging: <\/b>TSV, TMV, Stacking Method (CoW, WoW), Thinning, <br> \r\n        &nbsp;&nbsp;Planarization, Bonding, Bump, Stress and Thermal Analysis, Sealing,<br> \r\n        &nbsp;&nbsp;Cooling, Reliability.<\/p>\r\n    <\/div>\r\n<\/div>\r\n\r\n\r\n","protected":false},"featured_media":0,"template":"","txo_year":[13],"class_list":["post-40","cpt_admeta","type-cpt_admeta","status-publish","hentry","txo_year-13"],"aioseo_notices":[],"_links":{"self":[{"href":"https:\/\/www.admeta.org\/2023\/wp-json\/wp\/v2\/cpt_admeta\/40","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.admeta.org\/2023\/wp-json\/wp\/v2\/cpt_admeta"}],"about":[{"href":"https:\/\/www.admeta.org\/2023\/wp-json\/wp\/v2\/types\/cpt_admeta"}],"wp:attachment":[{"href":"https:\/\/www.admeta.org\/2023\/wp-json\/wp\/v2\/media?parent=40"}],"wp:term":[{"taxonomy":"txo_year","embeddable":true,"href":"https:\/\/www.admeta.org\/2023\/wp-json\/wp\/v2\/txo_year?post=40"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}