{"id":205,"date":"2023-03-24T12:53:20","date_gmt":"2023-03-24T03:53:20","guid":{"rendered":"https:\/\/www.admeta.org\/wp2023\/?post_type=cpt_admeta&#038;p=205"},"modified":"2023-03-24T12:53:20","modified_gmt":"2023-03-24T03:53:20","slug":"topics-2023-en","status":"publish","type":"cpt_admeta","link":"https:\/\/www.admeta.org\/2023\/en\/cpt_admeta\/topics-2023-en","title":{"rendered":"2023-4-en-Topics"},"content":{"rendered":"<h1 class=\"title\"><span style=\"font-family: 'times new roman', times, serif;\">Topics of Interest<\/span><\/h1>\n<div id=\"info\">\n<div class=\"border-double\">\n<p><span style=\"font-family: 'times new roman', times, serif;\"><b>[Topics of Interest]<\/b><\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\"><b>Integration:\u00a0<\/b>Interconnection Structure and Performance,<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\">\u00a0\u00a0 Parasitic Capacitance, Reliability Technology, Testing and Analysis<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\"><b>Reliability Science and Failure Analysis:\u00a0<\/b>EM, SIV, TDDB, Defect Detection<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\">\u00a0\u00a0and Analysis, Failure Mechanism and Modeling<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\"><b>Metallization:\u00a0<\/b>PVD, CVD, ALD, Plating, Barrier Metal, New Material, Alloy, \u00a0\u00a0Supercritical Fluid, Reflow<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\"><b>Low-k Dielectric:\u00a0<\/b>CVD, ALD, SOD, Film Properties, New Materials,<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\">\u00a0\u00a0Dielectric Structures (Air Gap), Metrology, etc.<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\"><b>CMP:\u00a0<\/b>Planarization Technology, Slurry, Pad, Dress, End Point Detection,<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\">\u00a0\u00a0Cleaning, Anti-corrosive Technology, etc.<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\"><b>Contact:\u00a0<\/b>Silicide, Interface, Solid Phase Reaction, Shallow Junction, Crystal \u00a0\u00a0Properties, Electron Properties, Carrier Transport, etc.<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\"><b>MEMS\/RF:\u00a0<\/b>Interconnection Structure and Materials, Packaging,<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\">\u00a0\u00a0 Fabrication Process Technology, Device Design, etc.<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\"><b>Emerging Technology:\u00a0<\/b>Active Wiring, Power Electronics, Silicon Photonics, \u00a0\u00a0Flexible Electronics, Energy Harvesting, etc.<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\"><b>Backend Device Technology:\u00a0<\/b>Tech. for Embedding Devices (MRAM,<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\">\u00a0\u00a0 PCRAM, ReRAM, DRAM etc.), Materials and Processing of Magnetics,<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\">\u00a0\u00a0 Phase-Change and Resistive-Change Devices, Electrode, Metallization, etc.<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\"><b>Nano Carbon:\u00a0<\/b>Graphene, Carbon Nanotube, Deposition, Integration,<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\">\u00a0\u00a0Electrical Characteristics, Reliability, Evaluation, Analysis, etc.<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\"><b>3D and Packaging:\u00a0<\/b>TSV, TMV, Stacking Method (CoW, WoW), Thinning,<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\">\u00a0\u00a0Planarization, Bonding, Bump, Stress and Thermal Analysis, Sealing,<\/span><br \/>\n<span style=\"font-family: 'times new roman', times, serif;\">\u00a0\u00a0Cooling, Reliability.<\/span><\/p>\n<\/div>\n<\/div>\n","protected":false},"featured_media":0,"template":"","txo_year":[30],"class_list":["post-205","cpt_admeta","type-cpt_admeta","status-publish","hentry","txo_year-30"],"aioseo_notices":[],"_links":{"self":[{"href":"https:\/\/www.admeta.org\/2023\/wp-json\/wp\/v2\/cpt_admeta\/205","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.admeta.org\/2023\/wp-json\/wp\/v2\/cpt_admeta"}],"about":[{"href":"https:\/\/www.admeta.org\/2023\/wp-json\/wp\/v2\/types\/cpt_admeta"}],"wp:attachment":[{"href":"https:\/\/www.admeta.org\/2023\/wp-json\/wp\/v2\/media?parent=205"}],"wp:term":[{"taxonomy":"txo_year","embeddable":true,"href":"https:\/\/www.admeta.org\/2023\/wp-json\/wp\/v2\/txo_year?post=205"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}