go to Japanese page
 Information
 About ADMETAPlus 2013
 Important Dates
 Travel
 Topics
 Call for Papers
 Special issu of JJAP
 Invited Speaker
 Tutorial
 Conference Program
 Oral Presentation
 Poster Presentation
 Registration
 Committee
 Contact
 Top Page
 

 Tutorial

On the day preceding the conference, a short course summarizing the current status of advanced ULSI metallization and interconnects will be presented, utilizing the collective wisdom of several leaders in the field.

*Official language of the short course is Japanese , and presentation and discussion will be made by Japanese except for 5).

Tutorial Program

1) Low-k Integration Tamotsu Owada (Fujitsu Semiconductor)
2) Image Sensor Nobukazu Teranishi ( Univ. of Hyogo, Shizuoka Univ.)
3) SiC Device Hiroshi Yano(Nara Institute of Science and Technology)
4) Marketing (Semiconductors) Tetsuya Wadaki (Nomura Securities)
5) 3D (TSV) Sunil Wickramanayaka(Institute of Microelectronics)
6) Basis of CVD Motoaki Kawase (Kyoto Univ.)
7) Metal Satoshi Kawashima (Meltex)
8) CMP Manabu Tsujimura (Ebara)


Notation based on the Specified Commercial Transaction Act 
 

(C) ADMETA2013 all rights reserved.